Sputtering Targets
In stock
Custom manufacturer 7 yrs CN
About Product
First reported by Grove in 1852 and Plucker in 1858, sputtering is a process whereby gas ions accelerated by a high voltage bombard a target and cause ejection of particles of atomic dimensions from the target material. The material is freed from the target then deposits on a nearby surface. If you are looking to move particles by way of sputtering, the R. D. Mathis Company offers you a wide selection of sputtering targets in a variety of diameters, purities and thicknesses. You will see below some of our standard sizes of 2″, 3″ and 4″ Sputtering Targets. Other sizes of 5″, 6″, 8″ and mm sizes, as well as custom sizes, are available on request. We also offer hard to find materials and alloys to meet your specific needs. Take a look at our selection below and let us know if you have any questions. We are here to help.
| Item # | Item Name | Brands | Purity | Diameter | Thickness |
|---|---|---|---|---|---|
| RDM-ST-AL5924 | 2 Inch (in) Diameter, Aluminum Sputtering Target | RDM | 99.999 % | 2 in | 0.25 in |
| RDM-ST-AL5934 | 3 Inch (in) Diameter, Aluminum Sputtering Target | RDM | 99.999 % | 3 in | 0.25 in |
| RDM-ST-AL5944 | 4 Inch (in) Diameter, Aluminum Sputtering Target | RDM | 99.999 % | 4 in | 0.25 in |
| RDM-ST-CR3924 | 2 Inch (in) Diameter, Chrome Sputtering Target | RDM | 99.95 % | 2 in | 0.25 in |
| RDM-ST-CR3934 | 3 Inch (in) Diameter, Chrome Sputtering Target | RDM | 99.95 % | 3 in | 0.25 in |
| RDM-ST-CR3944 | 4 Inch (in) Diameter, Chrome Sputtering Target | RDM | 99.95 % | 4 in | 0.25 in |
| RDM-ST-MO3924 | 2 Inch (in) Diameter, Molybdenum Sputtering Target | RDM | 99.95 % | 2 in | 0.25 in |
| RDM-ST-MO3934 | 3 Inch (in) Diameter, Molybdenum Sputtering Target | RDM | 99.95 % | 3 in | 0.25 in |
| RDM-ST-MO3944 | 4 Inch (in) Diameter, Molybdenum Sputtering Target | RDM | 99.95 % | 4 in | 0.25 in |
| RDM-ST-NB3924 | 2 Inch (in) Diameter, Niobium Sputtering Target | RDM | 99.95 % | 2 in | 0.25 in |
| RDM-ST-NB3934 | 3 Inch (in) Diameter, Niobium Sputtering Target | RDM | 99.95 % | 3 in | 0.25 in |
| RDM-ST-NB3944 | 4 Inch (in) Diameter, Niobium Sputtering Target | RDM | 99.95 % | 4 in | 0.25 in |
| RDM-ST-SN4924 | 2 Inch (in) Diameter, Tin Sputtering Target | RDM | 99.99 % | 2 in | 0.25 in |
| RDM-ST-SN4934 | 3 Inch (in) Diameter, Tin Sputtering Target | RDM | 99.99 % | 3 in | 0.25 in |
| RDM-ST-SN4944 | 4 Inch (in) Diameter, Tin Sputtering Target | RDM | 99.99 % | 4 in | 0.25 in |
| RDM-ST-TA3924 | 2 Inch (in) Diameter, Tantalum Sputtering Target | RDM | 99.95 % | 2 in | 0.25 in |
| RDM-ST-TA3934 | 3 Inch (in) Diameter, Tantalum Sputtering Target | RDM | 99.95 % | 3 in | 0.25 in |
| RDM-ST-TA3944 | 4 Inch (in) Diameter, Tantalum Sputtering Target | RDM | 99.95 % | 4 in | 0.25 in |
| RDM-ST-TI5924 | 2 Inch (in) Diameter, Titanium Sputtering Target | RDM | 99.999 % | 2 in | 0.25 in |
| RDM-ST-TI5934 | 3 Inch (in) Diameter, Titanium Sputtering Target | RDM | 99.999 % | 3 in | 0.25 in |
| RDM-ST-TI5944 | 4 Inch (in) Diameter, Titanium Sputtering Target | RDM | 99.999 % | 4 in | 0.25 in |
| RDM-ST-W3924 | 2 Inch (in) Diameter, Tungsten Sputtering Target | RDM | 99.95 % | 2 in | 0.25 in |
| RDM-ST-W3934 | 3 Inch (in) Diameter, Tungsten Sputtering Target | RDM | 99.95 % | 3 in | 0.25 in |
| RDM-ST-W3944 | 4 Inch (in) Diameter, Tungsten Sputtering Target | RDM | 99.95 % | 4 in | 0.25 in |
| RDM-ST-ZN4924 | 2 Inch (in) Diameter, Zinc Sputtering Target | RDM | 99.99 % | 2 in | 0.25 in |
| RDM-ST-ZN4934 | 3 Inch (in) Diameter, Zinc Sputtering Target | RDM | 99.99 % | 3 in | 0.25 in |
| RDM-ST-ZN4944 | 4 Inch (in) Diameter, Zinc Sputtering Target | RDM | 99.99 % | 4 in | 0.25 in |
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Website:https://rdmathis.com/
Company Name:R.D. Mathis Company
Location:Signal Hill, CA 90755
Description:Manufacturer of standard and custom vacuum evaporation sources for thin film coating and metallizing industries. Types include tungsten filaments, tungsten, molybdenum and tantalum boat sources, Alumina Coated Sources, box sources, crucibles, tungsten basket heaters and shielded and double shielded crucible heaters. Electron beam filaments, E-Beam Liners, low voltage AC power supplies and inert gas purifiers are available. Manufacturer of high purity, vacuum ready evaporative materials in pellet, wire, chunk, rod, granular, shot, slug and sheet or plate forms, Sputtering Targets. Types of materials include aluminum, chromium, cobalt, copper, germanium, hafnium, indium, iron, nichrome, nickel, permalloy, silicon, silicon dioxide, silicon monoxide, tantalum, tin, titanium, titanium oxide, zinc, zinc sulfide and zirconium. Gold, palladium, platinum and silver metals are available. E-beam liners and sputtering targets are also available.
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